Year: 2025
Type: article
Abstract: This study aims to explore new possibilities in visual art by applying the principles of optical illusion to art mask design. Among the various types of optical illusions, this study focuses on geometrical illusion, exploring its formative potential when applied to art mask design. Four art mask works were produced according to the compositional characteristics of the basic formative elements dot, straight line, curve, and plane. As a result, the study confirmed the specific perceptual effects and expressive methods that geometrical illusion can generate within art mask makeup. It is expected that the findings of this study will serve as foundational research data for the development of design studies applying visual principles to art masks, while also providing a basis for expanding into new genres that integrate art, design, and science and technology.
Authors: Dong-Hoon Lee, Sae-Young Shin
Institution: Seokyeong University
Language: English
Topic: Digital Media and Visual Art
Field: Computer Science
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W7117705298