Work

Plasma Etch Resistance Switching of oCVD Poly(3,4-Ethylenedioxythiophene) Thin Films via Mild Thermal Anneal and Liquid Water Exposure To Manipulate Antimony Incorporation

Year: 2026

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.5c18726

Authors: Nicholas M. Carroll, Carwynn D. Rivera, Jeremy M. Thelven, Brennon M. Brown, Man Hou Vong, Hannah R.M. Margavio, Cole A. Hodges, Hwan Oh, Gregory N. Parsons

Institution: North Carolina State University

Language: English

Topic: Conducting polymers and applications

Subfield: Polymers and Plastics

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Semiconductor Research Corporation

Award: G8853813660

OpenAlex ID: W7118455530

FWCI:

Cites: 66

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