Scalable Isotropic Atomic Layer Etching of SiO 2 via Thermo-Radical Activation
Year: 2026
Type: article
Source: Langmuir
Authors: Min Kyun Sohn, Jieun Kim, Seong Hyun Lee, Sun Kyu Jung, Jin-Ha Kim, Subin Heo, Sang-Hoon Kim, Jeong Woo Park, Dongwoo Suh
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Award: G7919854967
OpenAlex ID: W7118809125