Work

Modification of taC:H Films via λ = 266 nm Picosecond Pulsed Laser Irradiation

Year: 2026

Type: article

Abstract: Hydrogenated tetrahedral amorphous carbon (ta-C:H) thin films were modified using 266 nm picosecond laser pulses to investigate structural transformations at low and moderate fluences. Nitrogen-doped hydrogenated tetrahedral amorphous carbon layers 20–40 nm thick were deposited on silicon (Si) and silicon dioxide on silicon (SiO2/Si) substrates and irradiated with picosecond pulses at 0.5–1.6 J cm−2 using a raster-scanned beam. Structural changes in morphology, composition, and bonding were evaluated via optical microscopy, atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS), and Raman spectroscopy. Even below 1.0 J cm−2, localized color shifts and slight swelling indicated early structural rearrangements without significant material removal. Above 1.0–1.2 J cm−2, the films were largely ablated, although a persistent 3–6 nm carbon layer remained on both substrate types. XPS showed an increase in sp2-bonded carbon by roughly 15%–20% in optimally modified regions, and Raman spectroscopy revealed defect-activated D-bands and the formation of multilayer defective graphene or reduced-graphene-oxide-like flakes at ablation boundaries. These results indicate that picosecond ultraviolet irradiation enables controllable graphitization and thinning of ta-C:H films while maintaining uniform processing over centimeter-scale areas, providing a route to thin, conductive, partially graphitized carbon coatings for optical and electronic applications.

Source: Coatings

DOI: 10.3390/coatings16010067