Work

SiON Etch Characteristics Using Low-GWP C 2 F 4 O as a Replacement of CF 4

Year: 2026

Type: article

Source: ACS Sustainable Chemistry & Engineering

DOI: 10.1021/acssuschemeng.5c09945

Authors: Seul Ki Kim, Jun Soo Lee, Hyun Woo Tak, Akihide Sato, Chan Hyuk Choi, Myeong Ho Park, Jong Woo Hong, Bong Sun Kim, Eun Koo Kim, Sung Taek Kim, Dong Woo Kim, Yong Il Kim, Geun Young Yeom

Institution: Sungkyunkwan University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Climate action

Open Access status: closed

Funder: Ministry of Trade, Industry and Energy

Awards: G2252197380, G3181406793

OpenAlex ID: W7118903116

FWCI: 1.766

Cites: 32

Cited by: 1

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