Work

All water based nanoscale electron beam lithography using polyacrylic acid hydrogel as a resist

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0004947

Author: Devin K. Brown

Institution: Georgia Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7119492368

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Cites: 29

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