Year: 2026
Type: article
Abstract: Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
Source: Scilight
DOI: 10.1063/10.0042227
Author: Hannah Richter
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W7119534485
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