Work

A Critical Strain Window for Stabilizing Polar Orthorhombic Hf 0 . 5 Zr 0 . 5 O 2 Epitaxial Thin Films with Scale‐Free Domain Walls

Year: 2026

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.202521362

Authors: Linkun Wang, Jinxin Ge, Erhao Peng, Yangke Wu, Yanghe Wang, Yihan Lei, Yongqi Dong, Qiong Yang, Zhenlin Luo, Jiangyu Li, Changjian Li

Institutions: Southern University of Science and Technology, University of Science and Technology of China, National Synchrotron Radiation Laboratory, Xiangtan University

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China, Basic and Applied Basic Research Foundation of Guangdong Province

Awards: G1696919270, G1808929752, G3490259697, 氧化铪基铁电异质结铁电相变和存储特性的界面调控机理研究, G5605516852, G7451422119, G7769297428

OpenAlex ID: W7123343306

FWCI: 3.531

Cites: 35

Cited by: 2

Related to: