Work

The Influence of Focused Ion Beam Scanning Strategy on the Silicon Sputtering Process During the Formation of Micro- and Nanostructures

Year: 2025

Type: article

Source: Semiconductors

DOI: 10.1134/s1063782625700058

Authors: A. V. Rumyantsev, N. I. Borgardt, R. L. Volkov

Institution: National Research University of Electronic Technology

Language: English

Topic: Ion-surface interactions and analysis

Subfield: Computational Mechanics

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7123437151

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Cites: 28

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