Work

A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution limits

Year: 2026

Type: article

Source: Nanotechnology

DOI: 10.1088/1361-6528/ae376c

Authors: Yunsheng Deng, Shiyang Gao, Jingfu Xu, Xin Zhuang, Xing Cheng

Institution: Southern University of Science and Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Science, Technology and Innovation Commission of Shenzhen Municipality

Awards: G4114781844, G5244427266

OpenAlex ID: W7123495401

FWCI:

Cites: 30

Cited by:

Related to: