Simulation of Plasma-Chemical Processes in Ar/CF4 Mixture in a Short Low-Pressure Glow Discharge
Year: 2025
Type: article
Source: High Energy Chemistry
Authors: A. I. Saifutdinov, V. A. Purin
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7123756015
