Work

Atomic Layer Etching of HfO 2 and ZrO 2 Using NbF 5 and TiCl 4 in High-Aspect-Ratio Three-Dimensional Nanohole Structures

Year: 2026

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.5c02705

Authors: Boyun Choi, Getasew Mulualem Zewdie, Hyeyoung Shin, Nari Jeon

Institution: Chungnam National University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Chungnam National University, National Research Foundation of Korea

Awards: G1999385416, G2581263415, G4090505982, G6690792038

OpenAlex ID: W7123965896

FWCI: 1.766

Cites: 47

Cited by: 1

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