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Vanadium Dioxide Thin Films Deposited by ALD Using TDMAV and H₂O: Crystallization Kinetics for photonic applications

Year: 2025

Type: conference-paper

Abstract: National audience

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Authors: Drob, Manon, Nastase, Florin, Dubreuil, Pascal, Calvez, Stéphane

Institutions: National Institute for Research and Development in Microtechnologies, Laboratoire d'Analyse et d'Architecture des Systèmes

Language: English

Topic: Transition Metal Oxide Nanomaterials

Subfield: Polymers and Plastics

Field: Materials Science

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W7124234793

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