Work

UV absorption spectroscopy to study the role of CF radicals during cryogenic etching of Si in CF4 plasmas

Year: 2025

Type: conference-paper

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Authors: Kogelschatz, M, Nos, J, Iseni, S, Cunge, G, Lefaucheux, P, Dussart, R, Tillocher, T, Despiau-Pujo, E.

Institutions: Laboratoire des Technologies de la Microélectronique, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7124362257

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