Work

Electron Beam Lithography with Carboxylate‐Modified TiO 2 Nanoparticles for Sub‐20 nm Features

Year: 2026

Type: article

Source: Small Methods

DOI: 10.1002/smtd.202501332

Authors: Shicui Xing, Dong Wang, Zhipeng Fan, Xu Wang, Wenbing Kang, Qianqian Wang

Institutions: Shandong University, State Key Laboratory of Crystal Materials

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Shandong Province

Awards: G6817863652, G7643697402

OpenAlex ID: W7124423660

FWCI: 1.766

Cites: 65

Cited by: 1

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