Work

On the plasma etching mechanisms of high aspect ratio aluminum nitride nanowires patterning

Year: 2024

Type: conference-paper

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Authors: Sales de Mello, Saron, Jaloustre, Lucas, Labau, Sebastien, Petit-Etienne, Camille, Jacopin, Gwénolé, Pargon, Erwine

Institutions: Laboratoire des Technologies de la Microélectronique, Laboratoire d'Électronique des Technologies de l'Information

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7124516922

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