Work

III-V Heterostructure Plasma Etching for Low Cost and High Efficiency Photonic Devices

Year: 2025

Type: conference-paper

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Authors: de Lafontaine, Mathieu, Bidaud, Thomas, Gay, Guillaume, Pargon, Erwine, Petit-Etienne, Camille, Turala, Artur, Jaouad, Abdelatif, E. Valdivia, Christopher, Hinzer, Karin, Fafard, Simon, Aimez, Vincent, Darnon, Maxime

Language: English

Topic: Photonic and Optical Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7124519175

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