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Transient-Assisted Processing (TAP): A Path to Low-Emission Dry Etching in the Ångström-Node Era

Year: 2026

Type: article

Source: ACS Sustainable Chemistry & Engineering

DOI: 10.1021/acssuschemeng.5c07541

Authors: Atefeh Fathzadeh, Philippe Bezard, Emily Gallagher, Giel Arnauts, Stefan De Gendt

Institutions: KU Leuven, IMEC

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDGs: Responsible consumption and production, Climate action

Open Access status: closed

OpenAlex ID: W7124836493

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Cites: 13

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