Work

(Liquid) Metallic Photoresist for Monolithic Microlithography of Elastic Electronics

Year: 2026

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.72140

Authors: Zhenxiao Wang, Yinghong Li, Zhitong Zhang, Ziyan He, Xu Gao, Zhe Huang, Jin‐Hu Dou, Yaozheng Wang, Wei Wang, Zhihong Li, Yu‐Qing Zheng

Institutions: Peking University, National Key Laboratory of Science and Technology on Micro/Nano Fabrication, Ministry of Education of the People's Republic of China

Language: English

Topic: Nanomaterials and Printing Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Awards: G5194080870, G8109732359

OpenAlex ID: W7125005076

FWCI: 7.063

Cites: 56

Cited by: 4

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