Cobalt Precursor as Surface Inhibitor for Area-Selective Atomic Layer Deposition of Nanoscale Electronic Interconnects
Year: 2026
Type: article
Source: ACS Applied Nano Materials
Institution: Incheon National University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Funder: Merck KGaA
OpenAlex ID: W7125129654