Work

Pressure-controlled growth and mechanism of monolayer WSe2 via NaCl-assisted CVD

Year: 2026

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0305921

Authors: Jizhao Cui, Fuliang Dou, Jiaqi Yang, Feiyang Chen, Jun Li, Zhihong Feng, Dongchan Li

Institutions: Hebei University of Technology, Hebei Semiconductor Research Institute, State Key Laboratory of Reliability and Intelligence of Electrical Equipment

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7125559423

FWCI: 1.397

Cites: 35

Cited by: 1

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