Work

Cocktail Precursor Approach for Homogeneous ALD InGaO Film Growth Overcoming Limits of Mobility–Reliability Trade-Off in Oxide Semiconductors

Year: 2026

Type: article

Source: ACS Applied Materials & Interfaces

DOI: 10.1021/acsami.5c24086

Authors: Seong-Hwan Ryu, Dong-Gyu Kim, Haklim Koo, Kyuhyun Yeom, Dae Won Ryu, Chang-Kyun Park, Jin-Seong Park

Institutions: Hanyang University, Hansol Chemical (South Korea)

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Ministry of Trade, Industry and Energy, National Research Foundation of Korea

Awards: G1329546674, G4098451181, G623835629

OpenAlex ID: W7125561823

FWCI:

Cites: 45

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