Area‐Selective Atomic Layer Deposition of AlO x at the Buried Interface for High‐Performance Perovskite Solar Cells
Year: 2026
Type: article
Source: Angewandte Chemie
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G2695297133, G728836356, G8059687720
OpenAlex ID: W7127042200
