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Area‐Selective Atomic Layer Deposition of AlO x at the Buried Interface for High‐Performance Perovskite Solar Cells

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Year: 2026
Type: article
Source: Angewandte Chemie
DOI: 10.1002/ange.202516537
Authors: Jie Zhang, Yuehui Li, Liman Huo, Bing Yin, Yudi Wang, Qingshun Dong, Guozhen Liu, Xin Lu, Wenqi Han, Wenrui Li, Yilin Gao, Zheng Lv, Zhiyong Wang, Lida Liu, Yantao Shi
Institutions: Dalian University of Technology, State Key Laboratory of Fine Chemicals, Dalian Institute of Chemical Physics, Chinese Academy of Sciences
Language: English

Topic: Perovskite Materials and Applications
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
SDG: Affordable and clean energy

Open Access status: closed

Funders: National Natural Science Foundation of China, Fundamental Research Funds for the Central Universities
Awards: G2695297133, G728836356, G8059687720
OpenAlex ID: W7127042200
FWCI: 3.507
Cites: 34
Cited by: 2
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