Tailoring radiation tolerance of HfO2-ZrO2 ferroelectric nanolaminates via layer-thickness engineering
Year: 2026
Type: article
Abstract: Nanolaminate ferroelectric thin films, particularly those based on HfO2-ZrO2, are prized for their superior fatigue resistance. Yet their behavior under radiation remains incompletely understood,. The ferroelectric properties of HfO2-ZrO2 nanolaminate films with varying single-layer thicknesses were systematically investigated in this work. Compared with uniformly doped HZO films, the (15/15)5 and (37/37)2 nanolaminates initially show modestly reduced ferroelectric metrics. Electron irradiation was performed at a fluence rate of 5×1012 e/cm2·s, doped HZO films degrade markedly at every accumulated fluence investigated. The nanolaminate, however, display a distince trend: at a fluence of 1×1014 e/cm2 their electrical characteristics actually improve, whereas further exposure to fluence of 1×1015 e/cm2 and 5×1015 e/cm2, profressively erodes performance. These results furnish critical design guidance: by judiciously tailoring layer thickness and tolal fulence, HfO2-ZrO2 nanolaminate ferroelectric can be optimized for radiation-resistant applications, even as higher fluences ultimately pose limits.
Source: Journal of Alloys and Compounds
Institution: Sichuan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Estimated APC paid: $3,660
OpenAlex ID: W7127044146