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Material-resolved and thickness-sensitive lensless imaging using high-harmonic generation: From diffractive shear interferometry to ptychography

Year: 2025

Type: article

Abstract: Microscopy with table-top high-harmonic generation (HHG) sources enable high-resolution imaging with excellent material contrast, due to the short wavelength and numerous element-specific absorption edges available in this spectral range. However, accurate characterization of dispersive samples in terms of composition and thickness remains challenging due to the limitations of lens-based optics in this spectral range. Here, we performed spectrally resolved lensless imaging using multiple high harmonics. The diffractive shearing interferometry reconstruction serves as a foundational step for element-sensitive metrology, while ptychographic reconstruction enabled the retrieval of high-precision spectral imaging and quantitative thickness mapping. Our non-destructive method offers a powerful tool to extract both the material composition and layer thicknesses of complex nanostructured samples.

Source: Springer Link (Chiba Institute of Technology)

DOI: 10.1051/epjconf/202533501012/pdf

Authors: Fengling Zhang, Xiaomeng Liu, Antonios Pelekanidis, Matthias Gouder, Kjeld Eikema, Stefan Witte

Institutions: Advanced Research Center for Nanolithography (Netherlands), Vrije Universiteit Amsterdam, Delft University of Technology

Language: English

Topic: Advanced X-ray Imaging Techniques

Subfield: Radiation

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: green

OpenAlex ID: W7127099067

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