Work

Table-top HHG EUV scatterometry for roughness and structural parameters evaluation in nano-stacks

Year: 2025

Type: article

Source: Springer Link (Chiba Institute of Technology)

DOI: 10.1051/epjconf/202533501019/pdf

Authors: Vitaly Krasnov, Len Pasic, Analia Fernandez Herrero, Victor Soltwisch, Esben Witting Larsen, Kevin Dorney, Vicky Philipsen, Claudia Fleischmann

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7127100780

FWCI:

Cites:

Cited by:

Related to: