Universal and Nondestructive Direct Photolithography of Colloidal Quantum Dots Using Photocrosslinkable Polymer Blends (Adv. Funct. Mater. 10/2026)
Year: 2026
Type: article
Abstract: Direct Photolithography In their Research Article (10.1002/adfm.202520047), Jaehoon Lim, Do-Hoon Hwang, Jeongkyun Roh, and co-workers present a universal and nondestructive direct photolithography method that enables high-resolution quantum dot (QD) patterning without ligand exchange. By blending QDs with a photocrosslinkable polymer, this approach preserves optical properties while enhancing QD-LED efficiency and operational lifetime, paving the way for next-generation display technologies.
Source: Advanced Functional Materials
DOI: 10.1002/adfm.73798
Institutions: Pusan National University, Sungkyunkwan University
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: bronze
OpenAlex ID: W7127144764