Work

Grass formation and inverse aspect ratio dependent etching in SF6/O2/He plasma etching of silicon trenches: Synergistic control governed by CD effect via SiOxFγ passivation

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005168

Authors: Wencan Zhu, Maoxiang Liu, Wenli Wu, Enhao Zhao, Yongzhi Fang, Dongyu Cen, Leyi Zhang, Zhihong Gao, Xiujuan Meng, Fei Gao

Institution: Jiangnan University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7127157464

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Cites: 23

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