Work

Laser writing of amplitude masks and binary holograms on Si/Cr films with layer-by-layer selective etching

Year: 2025

Type: article

Source: Journal of Optical Technology

DOI: 10.1364/jot.92.000303

Authors: Dmitrij A. Belousov, Roman I. Kuts, Victor P. Korolkov, Anatoly I. Malyshev, Daria E. Kapustina

Institutions: Siberian Branch of the Russian Academy of Sciences, Novosibirsk State Technical University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7127369698

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Cites: 18

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