Work

Impact of Heating/cooling Rate on the Post-deposition Annealing of Llzo Thin Films

Year: 2026

Type: article

Source: Surface Review and Letters

DOI: 10.1142/s0218625x26500435

Authors: WEON CHEOL LIM, SO HEE KIM, ADITYA SHARMA, SANGSUL LEE, HYUN-JOON SHIN, KEUN HWA CHAE, JITENDRA PAL SINGH

Institutions: Korea Institute of Science and Technology, University of Petroleum and Energy Studies, Pohang University of Science and Technology, Pohang Accelerator Laboratory, Chungbuk National University, Manav Rachna University

Language: English

Topic: Advanced Battery Materials and Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7128028772

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Cites: 29

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