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Submicron Patterning Techniques for Perovskite Optoelectronics From Materials Challenges to Scalable Device Integration (Advanced Optical Materials 6/2026)

Year: 2026

Type: article

Abstract: Perovskite Patterning This cover illustrates five emerging fabrication strategies for perovskite optoelectronics, including thermal deposition, nanoimprint patterning, inkjet printing, and laser ablation. At the center is direct photolithography, where photo-crosslinkable perovskite resins enable high-resolution, maskless patterning. Together, these methods highlight a versatile toolbox for scalable and integration-ready perovskite device manufacturing. More details can be found in the Research Article by Gun Young Jung, Yusin Pak, and co-workers (DOI: 10.1002/adom.202502624).

Source: Advanced Optical Materials

DOI: 10.1002/adom.70879

Authors: Dante Ahn, Minz Lee, Youngsoo Jang, Gun Young Jung, Yusin Pak

Institutions: Korea University, Korea Institute of Science and Technology, Gwangju Institute of Science and Technology, Jeonbuk National University

Language: English

Topic: Perovskite Materials and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W7128539682

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