Work

Interlayer Stacking-Controlled Magnetism in Van der Waals Antiferromagnets

Year: 2026

Type: article

Source: ACS Nano

DOI: 10.1021/acsnano.5c19681

Authors: Guopeng Wang, Yupeng Ma, Hengli Duan, Rong Hu, Yu Tao, Shaohua Yang, Han Zhong, Jianlin Wang, Dongsheng Song, Yona Soh, Tianlun Yu, Bin Lei, Yimin Xiong, Pai Li, Yalin Lu, Mingliang Tian

Institutions: Anhui University, Paul Scherrer Institute, Chinese Academy of Sciences, Shanghai Institute of Microsystem and Information Technology, University of Science and Technology of China, High Magnetic Field Laboratory

Language: English

Topic: Magnetic properties of thin films

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, VINNOVA, National Key Research and Development Program of China

Awards: G4562458560, G6579959461, MAX IV operations 2019-2021

OpenAlex ID: W7128684866

FWCI: 2.72

Cites: 53

Cited by: 1

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