Work

Engineering Dielectric Genes in Debye Relaxation Model toward Frequency‐Band‐Reliant Electromagnetic Responses

Year: 2026

Type: article

Source: Advanced Materials

DOI: 10.1002/adma.202521471

Authors: Junye Cheng, Qingkui Chen, Honghan Wang, Yongheng Jin, Shan Jiang, Bailing Xie, Yifan Wang, Haoming Zheng, Bin Liu, Chao Wu, Guangping Zheng, Renchao Che

Institutions: Shenzhen MSU-BIT University, Beijing Institute of Technology, Zhejiang University of Science and Technology, Northwestern Polytechnical University, State Key Laboratory of Chemical Resource Engineering, Beijing University of Chemical Technology, China Construction Eighth Engineering Division (China), Hong Kong Polytechnic University, Fudan University

Language: English

Topic: Electromagnetic wave absorption materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Science and Technology Commission of Shanghai Municipality, Aeronautical Science Foundation of China

Awards: G1420369582, G1811748610, G1871402014, G2064091968, G2105391508, G3464208184, G4601653031, G4912378570, G5902887285, G7611740192

OpenAlex ID: W7128716046

FWCI: 37.49

Cites: 61

Cited by: 38

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