Hydrogen bond-mediated activation of HF in SiO2 thermal dry etching: A first-principles study of catalytic additives
Year: 2026
Type: article
DOI: 10.1116/6.0005142
Authors: Yihan Huang, Monica Sawkar Mathur
Institution: Lam Research (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7128798154