Work

Self-Intercalation Metallization Enables Low-Resistance Contacts in ZrSe 2 and HfSe 2

Year: 2026

Type: article

Source: Nano Letters

DOI: 10.1021/acs.nanolett.5c06220

Authors: Boyuan Di, Jie Yu, Yijia Jiang, Yuxiang Wang, Shiwan Zou, Liqiang Chen, Ziyi Dong, Jintian Li, Haixin Chang, Yonggang Yao, Wenfeng Zhang

Institutions: State Key Laboratory of Materials Processing and Die & Mould Technology, Huazhong University of Science and Technology

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Hubei Province, Shenzhen Science and Technology Innovation Program

Awards: G1581602197, G1719711068, G3533395199, G4010566091, G4663570690, G8056083984

OpenAlex ID: W7128958806

FWCI: 4.299

Cites: 46

Cited by: 3

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