Work

Seidel-based position-dependent aberration correction in Fourier holography

Year: 2026

Type: article

Abstract: This work presents a framework for modeling, measuring, and correcting position-dependent pupil aberrations in Fourier holography. Aberrations are characterized by six coefficients: four Seidel terms, tip, and tilt. Two efficient diffraction integral approximations are developed: a series expansion for defocus-like aberrations and a patch-based method for the general case. The coefficients are estimated by scanning over a range of values to optimize correction on a grid of target markers. Experiments on a compact Fourier holographic projector demonstrate substantial improvements in image sharpness across the entire field of view.

Source: Optics Express

DOI: 10.1364/oe.585598

Authors: Antoni J. Wojcik, Dilawer Singh, Ayan Rakshit, Hannah J. Joyce, Timothy D. Wilkinson

Language: English

Topic: Digital Holography and Microscopy

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funder: Engineering and Physical Sciences Research Council

Awards: EPSRC Centre for Doctoral Training in Integrated Functional Nano (i4Nano), EPSRC Centre for Doctoral Training in Connected Electronic and Photonic Systems (CEPS)