Work

Influence of Process Conditions of the Plasmochemical Etching of Polysilicon in a Cl2/Ar Mixture on Plasma Characteristics and Profile Evolution

Year: 2025

Type: article

Source: High Energy Chemistry

DOI: 10.1134/s0018143925700912

Authors: F. V. Oksanichenko, A. M. Efremov

Institutions: Moscow Institute of Physics and Technology, Scientific and Production Association of Electromechanics (Russia), Research Institute of Molecular Electronics

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7128998441

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Cites: 9

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