van der Waals dielectrics for threshold engineering in two-dimensional field effect transistors
Year: 2026
Type: article
Abstract: Two-dimensional (2D) semiconductors are promising for next-generation field-effect transistors (FETs), but their integration into complementary-metal-oxide-semiconductors (CMOS) logic is hindered by improper threshold voltages ($${V}_{{th}}$$), leading to excessive power consumption. While past efforts have focused on improving gate electrostatics and near-ideal subthreshold swing ($${SS}$$), systematic $${V}_{{th}}$$ engineering in 2D FETs remains unexplored. Here, we investigate high-κ van der Waals (vdW) dielectrics including metal oxyhalides such as LaOBr, BiOBr, and BiOCl, and bimetallic thiophosphates such as LiInP2S6 (LIPS), LiInP2Se6 (LIPSe) and CuInP2S6 (CIPS), and demonstrate that bimetallic thiophosphates enable programmable and non-volatile $${V}_{{th}}$$ tuning in both n-type monolayer MoS2 and p-type bilayer WSe2 FETs. Leveraging ion-mediated $${V}_{{th}}$$ tuning, we realize 2D CMOS inverters with nearly three orders of magnitude reduction in static power while maintaining high switching speed. Combining experiments with industry-compatible SPICE modeling, we identify an optimal $${V}_{{th}}$$ window that minimizes power with negligible delay overhead, enabling built-in power gating and improved power–performance–area metrics without additional sleep transistors. The limited tunability of threshold voltage is a major obstacle for applying two-dimensional transistors in post-silicon electronics. Here, the authors show that bimetallic thiophosphates, such as LiInP2S6, enable programmable threshold voltages in both n-type and p-type 2D transistors, leading to low-power, high-speed complementary logic inverters.
Source: Nature Communications
Language: English
Subfield: Materials Chemistry
Field: Materials Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $6,990
Funders: National Science Foundation, Northwestern University, Department of Science and Technology, Ministry of Science and Technology, India, Ministerstvo Školství, Mládeže a Tělovýchovy, Grantová Agentura České Republiky, Ministry of Education, India, European Regional Development Fund, Office of Naval Research, Division of Materials Research, Division of Electrical, Communications and Cyber Systems, Army Research Office
Awards: G12500569, Next Generation of 2D Monoelemental Materials, G176604203, G291036901, G310591998, G3490171961, MIP: 2D Crystal Consortium (MIP-2DCC), G3829267213, G4131035492, Searching for novel 2D nanomagnets for applications in nanoelectronic and spintronic, G4653638168, CAREER: Two-Dimensional Straintronic Field Effect Transistor, G5124248554, Collaborative Research: FuSe: Indium selenides based back end of line neuromorphic accelerators, G5641063287, G5916014575, Rare-earth oxyhalides as novel dielectrics, Defining Reaction Paths for Chalcogenide Materials Discovery, G7140124603, G7452299184, G805152270, G8832744467, G8876996369
OpenAlex ID: W7129055439
