Work

Investigation of surface reactions of etched SiN films using HF/PF3 gas mixture plasma under cryogenic conditions via in-line XPS: The role of ammonium salts in etch rate enhancement

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005201

Authors: Junji Kataoka, Yuma Kato, Daiki Iino, Kazuaki Kurihara, Hiroyuki Fukumizu

Institution: KIOXIA Corporation (Japan)

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7129438200

FWCI: 3.531

Cites: 24

Cited by: 2

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