Work

Ligand Regulation and Mechanism Study of Organotin Carboxylate Resists in DUV Lithography

Year: 2026

Type: article

Source: Inorganic Chemistry

DOI: 10.1021/acs.inorgchem.5c05912

Authors: Tianren Liu, Yuan Chen, Yuan Chen, Guoping Liu, Xiaofei Liu, Kexin Jiang, Sihai Luo, Jinggang Gai, Yuanfu Chen, Yuanfu Chen, Xiangang Luo, Jingxin Lei, Dongxu Yang

Institutions: Chinese Academy of Sciences, Sichuan University, Institute of Optics and Electronics, Chinese Academy of Sciences, University of Electronic Science and Technology of China, Xi'an Jiaotong University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Department of Science and Technology of Sichuan Province

Awards: G6401976363, G807212211

OpenAlex ID: W7130512034

FWCI: 1.677

Cites: 44

Cited by: 1

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