Fabrication of low-loss silicon nitride PICs for stimulated Brillouin scattering
Year: 2024
Type: conference-paper
Abstract: Silicon nitride (Si3N4) is well-established in PIC technology due to its low loss, broad transparency and seamless compatibility with existing semiconductor fabrication processes. We have developed a thin Si3N4 platform supporting low-loss waveguiding and high-Q resonators. We measure stimulated Brillouin scattering using a lock-in amplifier, enabling the development of future high-performance acousto-optic devices.
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W7130911047
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