Designing pulsed plasma etch processes by genetic algorithm
Year: 2026
Type: article
DOI: 10.1116/6.0005164
Authors: Patrick Conlin, Shyam Sridhar, Peter Ventzek
Institution: Tokyo Electron (Japan)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7134253454