Termination-Dependent HF Activation on 4H-SiC (112−0): Pt–Ni–C–N 4 Dual-Atom Catalysts Promote Etching Kinetics─A First-Principles Study
Year: 2026
Type: article
Source: Langmuir
Authors: Yuncai Jiang, Shuangying Lei, Zaifa Zhou
Institution: Southeast University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W7135047201