Work

Vapor-Phase Dry Development of a Nanoscale Zn-Based Metal–Organic Extreme Ultraviolet Photoresist via Surface-Limited β-Diketone Chelation for High-Resolution Patterning

Year: 2026

Type: article

Source: ACS Applied Nano Materials

DOI: 10.1021/acsanm.6c00102

Authors: Ji-Hoo Seok, Jiwon Kim, Hyeonseok Ji, Jaehyuk Lee, Taeho Lee, Kwang-Sub Yoon, Myung Mo Sung, Jinho Ahn

Institutions: Hanyang University, Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Research Foundation of Korea

Awards: G5686104555, G623835629

OpenAlex ID: W7135195652

FWCI: 3.37

Cites: 50

Cited by: 2

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