Work

Band Offset Analysis at the Te/ALD-Grown Al 2 O 3 Heterojunction for Transistor Applications

Year: 2026

Type: article

Source: ACS Applied Electronic Materials

DOI: 10.1021/acsaelm.6c00067

Authors: Janggeun Shin, Tae In Kim, Ick-Joon Park

Institutions: Joongbu University, Inha University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: Hansung University, Inha University, Korea Basic Science Institute, National Research Foundation of Korea

Awards: G2897972150, G4743538243

OpenAlex ID: W7135206845

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Cites: 46

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