Work

Facile Deposition of Metal Films on a Diamond Protected Silicon Window for In Situ ATR-IR Spectroelectrochemistry across a Wide pH Range

Year: 2026

Type: article

Source: Analytical Chemistry

DOI: 10.1021/acs.analchem.6c00548

Authors: Wei-Yi Zhang, Xindi Xu, Yunfang Yan, Yaning Guan, Xian-Yin Ma, Tian-Wen Jiang, Kun Jiang, Wen-Bin Cai

Institutions: Fudan University, Collaborative Innovation Center of Chemistry for Energy Materials

Language: English

Topic: Electrochemical Analysis and Applications

Subfield: Electrochemistry

Field: Chemistry

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, National Key Research and Development Program of China, Fundamental Research Funds for the Central Universities, Science and Technology Innovation Plan Of Shanghai Science and Technology Commission

Awards: G1850344169, G1877785, G2926752744, G401954373, G526175245, G5856726522, G8830874902

OpenAlex ID: W7138080481

FWCI:

Cites: 58

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