Work

The Evolution of Cryogenic Etching Plasma Processes Since Their Introduction 35 Years Ago

Year: 2024

Type: conference-paper

Source: HAL (Le Centre pour la Communication Scientifique Directe)

Author: Dussart, Rémi

Institution: Groupe de Recherches sur l'Energétique des Milieux Ionisés

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7138828601

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