Work

Formation of Nanoscale Radiation Fluxes for X-ray Scanning Lithography

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725601626

Authors: V. K. Egorov, E. V. Egorov

Institutions: Russian Academy of Sciences, Institute of Microelectronics Technology and High Purity Materials, Kotelnikov Institute of Radioengineering and Electronics of the Russian Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140092490

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Cites: 17

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