Work

Physical Principles of in situ Sidewall Profile Control in Cryogenic Plasma Etching of HAR Silicon Microstructures

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725601377

Authors: K. Rudenko, A. Miakonkikh, V. Kuzmenko, K. Fetisenkova, A. Melnikov

Institution: Kurchatov Institute

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140100586

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Cites: 15

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