Work

Analysis of the Causes of the LER Effect and Methods for Reducing Its Magnitude

Year: 2025

Type: article

Source: Russian Microelectronics

DOI: 10.1134/s1063739725601651

Authors: M. S. Kulpinov, M. G. Putrya, A. A. Golishnikov, V. V. Losev, A. G. Balashov

Institution: National Research University of Electronic Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7140108518

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Cites: 17

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